The enhanced photoresist shrink process technique toward 22nm nodeOYAMA, Kenichi; YAMAUCHI, Shohei; YABE, Kazuo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79722Q.1-79722Q.6, 2Conference Paper

Novel approaches to implement the self-aligned spacer double-patterning process toward 11-nm node and beyondYAEGASHI, Hidetami; OYAMA, Kenichi; YABE, Kazuo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79720B.1-79720B.7, 2Conference Paper

Advanced resist process enabling implementation of CD controllability for 32nm and beyondSHIMURA, Satoru; IWAO, Fumiko; KAWASAKI, Tetsu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69233C.1-69233C.6, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Implementation of Double Patterning process toward 22-nm nodeYAEGASHI, Hidetami; NISIMURA, Eiichi; YABE, Kazuo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 75201E.1-75201E.9Conference Paper

The Important Challenge to Extend Spacer DP process towards 22nm and beyondOYAMA, Kenichi; NISIMURA, Eiichi; YAMAJI, Tomohito et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763907.1-763907.6, 2Conference Paper

Fabrication of 32nm Contact/Via Hole by Photolithographic-friendly MethodKAWASAKI, Tetsu; SHIMURA, Satoru; IWAO, Fumiko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692333.1-692333.7, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper